Detalls del llibre
This is the first book to cover CVD growth processes at the atomic level using a combination of theoretical and experimental tools, including density functional theory (DFT) calculations. By demonstrating the methodology behind the modelling and simulation of CVD growth processes, the text provides guidance and practical advice on how to acquire successful theoretical results.
- Autor/a Professor Karin Larsson
- ISBN13 9780750331050
- ISBN10 0750331054
- Pàgines 400
- Any Edició 2022
- Fecha de publicación 08/12/2022
- Idioma Alemany, Francès
Ressenyes i valoracions
Chemical Vapour Deposition: Growth processes on an atomic level (Alemany, Francès)
- De
- Professor Karin Larsson
- 9780750331050



